Ion Implantation and Activation Volume 1 1st Edition by Kunihiro Suzuki ISBN 978-1608057825 1608057828
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Product details:
ISBN 10: 1608057828
ISBN 13: 978-1608057825
Author: Kunihiro Suzuki
Ion Implantation and Activation presents the derivation process of related models in a comprehensive step by step manner starting from the fundamental processes and moving up into the more advanced theories. Ion implantation can be expressed theoretically as a binary collision, and, experimentally using various mathematical functions. Readers can understand how to establish an ion implantation database by combining theory and experimental data. The models described in this book can be directly related to practical experimental data with various approaches: physical, empirical or experimental. Readers can also understand the approximations, and assumptions to reach these models. The redistribution and activation of implanted impurities during subsequent thermal processes are also important subjects and they are described in a broad manner with the combination of theory and experiment, even though many of the models are not well established. Chapters in the book explain, in depth, various topics such as Pearson functions, LSS theory, Monte Carlo simulations, Edgeworth Polynomials and much more. This book provides advanced engineering and physics students and researchers with complete and coherent coverage of modern semiconductor process modeling. Readers can also benefit from this volume by acquiring the necessary information to improve contemporary process models by themselves.
Table of contents:
1. Selection of Impurities
2. Physics of Ion Implantation
3. Monte Carlo Simulation
4. Analytical Model for Ion Implantation Profiles
5. Pearson Function Family
6. The Other Analytical Model for Ion Implantation Profiles: Edgeworth Polynomial
7. Parameter Extraction for Analytical ion Implantation Profile Model
8. Lateral Distribution
9. LSS Theory
10. Quasi Crystal LSS Theory
11. Simplified LSS Theory
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