Directed Self assembly of Block Co polymers for Nano manufacturing 1st Edition by Roel Gronheid, Paul Nealey ISBN 0081002505 978-0081002506
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ISBN 10: 0081002505
ISBN 13: 978-0081002506
Author: Roel Gronheid, Paul Nealey
The directedself-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology.
Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA.Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques.
Table of contents:
Part One Physics and chemistry of block copolymer (BCP) materials
1 Physics of block copolymers from bulk to thin films
H. Yoshida, M. Takenaka
1.1 Introduction
1.2 Order–disorder transition of block copolymers
1.3 Morphologies of diblock copolymer/homopolymer mixtures
1.4 Dynamics of phase transition in block copolymers
1.5 Structures of block copolymer in thin films
1.6 Conclusion
References
2 RAFT synthesis of block copolymers and their self-assembly properties
W.B. Farnham, M.T. Sheehan
2.1 RAFT process description
2.2 Polymerization process details
2.3 RAFT end-group catalytic radical reduction
2.4 Block Copolymer In situ Topcoat Applications
2.5 DSA Applications
2.6 High chi block copolymers
2.7 Conclusions
Acknowledgments
References
3 Thermal and solvent annealing of block copolymer films
X. Yu, Y. Han
3.1 Introduction
3.2 Thermal annealing of BCPs films
3.3 Solvent annealing of BCPs films
3.4 Summary and outlook
References
4 Field-theoretic simulations and self-consistent field theory for studying block copolymer directed self-assembly
V.V. Ginzburg, J.D. Weinhold, P.D. Hustad, P. Trefonas, B. Kim, N. Laachi, G.H. Fredrickson
4.1 Introduction
4.2 Overview of field-theory-based simulations of block copolymer DSA
4.3 Chemoepitaxy modeling
4.4 Graphoepitaxy modeling
4.5 Summary and outlook
References
Part Two Templates and patterning for directed self-assembly
5 Directed self-oriented self-assembly of block copolymers using topographical surfaces
J. Choi, K.R. Carter, T.P. Russell
5.1 Introduction
5.2 Control of interfacial interactions
5.3 Graphoepitaxy
5.4 Application of BCPs guided by topographical surfaces
5.5 Summary and outlook
References
6 Directed self-oriented self-assembly of block copolymers using chemically modified surfaces
R. Seidel, L. Williamson, T. Segal-Peretz, G. Wu, H.S. Suh, C. Zhou, S. Xiong, G.S.W. Craig, P.F. Nealey
6.1 Introduction
6.2 Fabrication of chemical patterns
6.3 Thermodynamics of thin film BCP assembly on chemical patterns
6.4 Kinetics of thin film BCP assembly on chemical patterns
6.5 High-resolution patterning
6.6 Applications
6.7 Conclusion
References
7 X-ray characterization of directed self-assembly block copolymers
D.F. Sunday, R.J. Kline
7.1 Introduction
7.2 Interactions of X-rays with matter
7.3 SAXS and RSoXS
7.4 Thermodynamics
7.5 Critical dimension small-angle X-ray scattering
7.6 Conclusions and future direction
8 Self-assembly of block copolymers by graphoepitaxy
Samuel M. Nicaise, K.G. Amir Tavakkoli, Karl K. Berggren
8.1 Introduction
8.2 DSA for uniform 1D and 2D patterned arrays
8.3 Aperiodic nanostructures
8.4 Multilayer structures
8.5 Conclusion
Acknowledgments
References
Part Three Application of directed self-assembly in nanomanufacturing
9 The inverse directed self-assembly problem
A. Latypov, T.H. Coskun
9.1 Introduction
9.2 DSA model and inverse DSA problem
9.3 Conclusions and future directions
Acknowledgments
References
10 Directed self-assembly guiding template design for contact hole patterning
H. Yi, H.-S.P. Wong
10.1 Flexible control of directed self-assembly using physical guiding templates
10.2 Contact/via patterning using block copolymer DSA—practical examples
10.3 Alphabet approach: A general design strategy for DSA contact/via patterning
Acknowledgments
References
11 Modelling and analysis of large-scale, template self-assembly manufacturing techniques
J. Andres Torres
11.1 Large-scale modeling requirements
11.2 Applications of lamella systems
11.3 Applications of cylinder forming diblock-copolymers
11.4 Applying cylinder forming grapho-epitaxy to a contact/via process
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Roel Gronheid,Paul Nealey,Directed Self,Block Co polymers,Nano manufacturing